Advances in Imaging and Electron Physics Including Proceedings CPO-10
Advances in Imaging and Electron Physics, Volume 212, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

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Advances in Imaging and Electron Physics Including Proceedings CPO-10
Advances in Imaging and Electron Physics, Volume 212, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

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Advances in Imaging and Electron Physics Including Proceedings CPO-10

Advances in Imaging and Electron Physics Including Proceedings CPO-10

Advances in Imaging and Electron Physics Including Proceedings CPO-10
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Advances in Imaging and Electron Physics Including Proceedings CPO-10

Advances in Imaging and Electron Physics Including Proceedings CPO-10

Overview

Advances in Imaging and Electron Physics, Volume 212, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

Product Details

ISBN-13: 9780128174753
Publisher: Elsevier Science
Publication date: 10/15/2019
Series: Advances in Imaging and Electron Physics , #212
Pages: 376
Product dimensions: 6.00(w) x 9.00(h) x (d)

About the Author

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Table of Contents

Part I. Papers from the Tenth International Conference on Charged Particle Optics
1. Planar multi-reflecting time-of-flight mass-spectrometer of a simple design
Seitkerim B. Bimurzaev
2. Generalization of paraxial trajectory method for the analysis of non-paraxial rays
Shin Fujita
3. Test and characterization of a new post-column imaging energy filter
Frank Kahl, Volker Gerheim, Martin Linck, Heiko Müller, Richard Schillinger, Stephan Uhlemann
4. Electron optics for a multi-pass transmission electron microscope
Marian Mankos, Stewart A. Koppell, Brannon B. Klopfer, Thomas Juffmann, Vladimir Kolarik, Khashayar Shadman, Mark Kasevich
5. A simulation program for electron mirrors using Boundary Element Method
Eric Munro, Haoning Liu, Catherine Rouse, John Rouse
6. An algorithm for simulating the geometric optics of charged particle instruments
Khashayar Shadman

Part II. The Nano-aperture Ion Source
7. Introduction to focused ion beams, ion sources, and the nano-aperture ion source
Leon van Kouwen
8. Nano-fluidic flow in the nano-aperture ion source
Leon van Kouwen
9. Optics of ion emission from the nano-aperture ion source
Leon van Kouwen
10. A model for ion-neutral scattering in the nano-aperture source
Leon van Kouwen
11. Ion emission simulations of the nano-aperture ion source
Leon van Kouwen
12. Processes in the ionization volume of the nano-aperture ion source
Leon van Kouwen

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