Amorphous and Heterogeneous Silicon-Based Films - 2001: Volume 664

Amorphous and Heterogeneous Silicon-Based Films - 2001: Volume 664

by Martin Stutzmann, J. D. Cohen, R. W. Collins, J. Hanna, M. Stutzmann
     
 

This book looks at the exchange of information on the physics and application of amorphous and microcrystalline silicon and presents exciting new developments. Significant progress has been made in the high- or even ultra-high-rate deposition of device-quality amorphous and microcrystalline silicon, in in-situ growth characterization techniques and in

Overview

This book looks at the exchange of information on the physics and application of amorphous and microcrystalline silicon and presents exciting new developments. Significant progress has been made in the high- or even ultra-high-rate deposition of device-quality amorphous and microcrystalline silicon, in in-situ growth characterization techniques and in state-of-the-art computer modeling of deposition processes. These issues are especially important for the successful future commercialization of silicon thin-film devices. The latest results concerning silicon thin-film solar cells are highlighted. Active matrix arrays for displays or sensors continue to be the second major application of thin silicon films, and again much progress has been made in that area. Topics include: nucleation and growth; novel concepts; hot-wire CVD; high-rate deposition; growth of silicon and silicon-alloy thin films; crystallization; silicon-based alloys; structural properties of heterogeneous silicon films; dopants and impurities; amorphous and silicon solar cells; metastability; hydrogen and metastability; transport in µc-Si; thin-film transistors; hydrogenation and oxidation; defects and defect spectroscopy; structural and electronic properties of thin silicon films; heterojunctions; TFTs and sensors; amorphous-to-microcrystalline transition and structural relaxation and diffusion.

Editorial Reviews

Contains 143 papers, presented at the April 2001 symposium, written by scientists and engineers working on the physics and application of amorphous and microcrystalline silicon films. The papers are organized into sections on nucleation and growth, hot wire chemical vapor deposition, high rate deposition, growth of silicon and silicon-alloy thin films, crystallization, silicon-based alloys, structural properties of heterogeneous silicon films, dopants and impurities, amorphous silicon solar cells, metastability, hydrogen and metastability, microcrystalline silicon solar cells, transport in silicon, thin film transistors, sensors, hydrogenation and oxidation, theory and computer modeling, defects and defect spectroscopy, structural and electronic properties of thin silicon films, heterojunctions, amorphous and microcrystalline structures, thin film transistors and sensors, amorphous-to-microcrystalline transition, and structural relaxation and diffusion. Annotation c. Book News, Inc., Portland, OR (booknews.com)

Product Details

ISBN-13:
9781558996007
Publisher:
Cambridge University Press
Publication date:
10/15/2001
Series:
MRS Proceedings Series
Pages:
984
Product dimensions:
6.40(w) x 9.30(h) x 2.30(d)

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