CCD Image Sensors in Deep-Ultraviolet: Degradation Behavior and Damage Mechanisms / Edition 1

CCD Image Sensors in Deep-Ultraviolet: Degradation Behavior and Damage Mechanisms / Edition 1

by Flora Li
     
 

ISBN-10: 3642061524

ISBN-13: 9783642061523

Pub. Date: 12/15/2010

Publisher: Springer Berlin Heidelberg

As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspection of deep sub-micron features in integrated circuits.

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Overview

As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspection of deep sub-micron features in integrated circuits. DUV-sensitive charge-coupled device (CCD) cameras are in demand for these applications. Although CCD cameras that are responsive at DUV wavelengths are now available, their long-term stability is still a major concern. This book describes the degradation mechanisms and long-term performance of CCDs in the DUV, along with new results of device performance at these wavelengths.

Product Details

ISBN-13:
9783642061523
Publisher:
Springer Berlin Heidelberg
Publication date:
12/15/2010
Series:
Microtechnology and MEMS Series
Edition description:
Softcover reprint of hardcover 1st ed. 2005
Pages:
232
Product dimensions:
0.51(w) x 6.14(h) x 9.21(d)

Table of Contents

Introduction.- Overview of CCD.- CCD Imaging in the Ultraviolet Regime.- Silicon.- Silicon Dioxide.- Si-SiO2 Interface.- General Effects of Radiation.- Effects of Radiation on CCDs.- UV-Induced Effects in Silicon.- UV-Laser-Induced Effects in SiO2.- UV-Laser-Induced Effects in the Si-SiO2 Interface.- CCD Measurements at 157 nm.- Design Optimizations for Future Research.- Concluding Remarks.- Glossary.

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