Chemical Vapor Deposition: Principles and Applications

Chemical Vapor Deposition: Principles and Applications

by M. L. Hitchman
     
 

ISBN-10: 0123496705

ISBN-13: 9780123496706

Pub. Date: 03/09/2000

Publisher: Elsevier Science

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific

Overview

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.

Product Details

ISBN-13:
9780123496706
Publisher:
Elsevier Science
Publication date:
03/09/2000
Pages:
677
Product dimensions:
1.56(w) x 6.14(h) x 9.21(d)

Table of Contents

M.L. Hitchman and K.F. Jensen, Chemical Vapour Deposition—An Overview. K.F. Jensen, Fundamentals of Chemical Vapour Deposition. W.G. Breiland and P. Ho, Analysis of Chemical Vapor Deposition Processes. M.L. Hitchman and K.F. Jensen, Chemical Vapor Deposition at Low Pressures. B.S. Meyerson, Silicon Epitaxy by Chemical Vapor Deposition. R.L. Moon and Y.-M. Houng, Organometallic Vapor Phase Epitaxy of III-V Materials. D.W. Hess and D.B. Graves, Plasma-Assisted Chemical and Vapor Deposition. V.R. McCrary and V.M. Donnelly, Photo-Assisted Chemical Vapor Deposition. W.B. Jackson, Electronic and Optical Characterization of Chemical Vapor Deposition Films for Device Applications. G. Wahl, Protective Coatings. Index.

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