Fundamental Principles of Optical Lithography: The Science of Microfabrication / Edition 1

Fundamental Principles of Optical Lithography: The Science of Microfabrication / Edition 1

by Chris Mack
     
 

ISBN-10: 0470727306

ISBN-13: 9780470727300

Pub. Date: 01/22/2008

Publisher: Wiley

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components.

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Overview

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components.

By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate.

This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter.

Additional Information:
Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

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Product Details

ISBN-13:
9780470727300
Publisher:
Wiley
Publication date:
01/22/2008
Pages:
534
Sales rank:
1,218,715
Product dimensions:
6.69(w) x 9.61(h) x 1.08(d)

Table of Contents

1 Introduction to Semiconductor Lithography 1

2 Aerial Image Formation - The Basics 29

3 Aerial Image Formation - The Details 75

4 Imaging in Resist: Standing Waves and Swing Curves 129

5 Conventional Resists: Exposure and Bake Chemistry 191

6 Chemically Amplified Resists: Exposure and Bake Chemistry 223

7 Photoresist Development 257

8 Lithographic Control in Semiconductor Manufacturing 297

9 Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope 369

10 Resolution Enhancement Technologies 411

Appendix A Glossary of Microlithographic Terms 457

Appendix B Curl, Divergence, Gradient, Laplacian 491

Appendix C The Dirac Delta Function 495

Index 501

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