Fundamentals of Electrochemical Deposition / Edition 2

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Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields."
-Corrosion on the First Edition of Fundamentals of Electrochemical Deposition

From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge.

The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including:
* Metal-solution interphase
* Charge transfer across an interphase
* Formation of an equilibrium electrode potential
* Nucleation and growth of thin films
* Kinetics and mechanisms of electrodeposition
* Electroless deposition
* In situ characterization of deposition processes
* Structure and properties of deposits
* Multilayered and composite thin films
* Interdiffusion in thin film
* Applications in the semiconductor industry and the field of medicine

This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material.

Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

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Editorial Reviews

From the Publisher
"…an excellent book for explaining electrochemical depositionto students, practicing engineers, or scientists…"(Journal of Metals Online, July 25, 2007)

"…a great book for anyone who wants to learn about thefundamentals of electrochemical deposition." (IEEE ElectricalInsulation Magazine, July/August 2007)

"The book is a definitive treatment of the subject by twoexperts in the field…" (CHOICE, February 2007)

An introduction for readers who are new to the field, only fortuitously appearing at the moment the microelectronics industry is shifting from aluminum connections, which are formed by evaporation, to copper, which are electrodeposited. Among other topics, discusses water and ionic solutions, nucleation and growth models, the effect of additives, and mathematical modeling. Suitable as a text for advanced science and engineering students. References are specific to sub- chapter sections. Annotation c. by Book News, Inc., Portland, Or.
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Product Details

  • ISBN-13: 9780471712213
  • Publisher: Wiley
  • Publication date: 8/4/2006
  • Series: ECS Series of Texts and Monographs Series , #45
  • Edition description: Revised Edition
  • Edition number: 2
  • Pages: 373
  • Product dimensions: 6.32 (w) x 9.41 (h) x 0.94 (d)

Meet the Author

MILAN PAUNOVIC, PhD, was, until recently, a research staffmember in the Electrodeposition Technology Department at the IBM T.J. Watson Research Center. He began work on electrochemical metaldeposition in 1961 at the University of Pennsylvania, Philadelphia,and subsequently worked on metal deposition at Reynolds Metals,Kollmorgen, and Intel. He is a coauthor of the first edition ofFundamentals of Electrochemical Deposition and ModernElectroplating (both by Wiley), has edited four symposiaproceedings volumes of The Electrochemical Society, publishedforty-one papers, and holds seven patents.

MORDECHAY SCHLESINGER, PhD, is a professor in theDepartment of Physics at the University of Windsor, Ontario,Canada. He is a former associate editor of both the Journal of TheElectrochemical Society and Electrochemical and Solid StateLetters. He is a fellow of the American Physical Society and TheElectrochemical Society. He has also been named a General MotorsAcademic Research Fellow. He is a coauthor of the first edition ofFundamentals of Electrochemical Deposition and of ModernElectroplating. He has published over 120 research papers and holdsfour patents.

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Table of Contents

Preface to the Second Edition.

Preface to the First Edition.

1. Overview.

2. Water and Ionic Solutions.

3. Metals and Metal Sufaces.

4. Metal-Solution Interphase.

5. Equilibrium Electrode Potential.

6. Kinetics and Mechanism of Electrodeposition.

7. Nucleation and Growth Models.

8. Electroless Deposition.

9. Displacement Deposition.

10. Effect of Additives.

11. Electrodeposition of Alloys.

12. Metal Deposit and Current Distribution.

13. Characterization of metallic Surfaces and Thin Films.

14. In Situ Characterization of Deposition.

15. Mathematical Modeling in Electrochemistry.

16. Structure anad Properties of Deposits.

17. Electrodeposited Multilayers.

18. Interdiffusion in Thin Films.

19. Applications in Semiconductors Technology.

20. Applications in the Fields of Magnetism andMicroelectronics.

21. Frontiers in Applications: Applications in the Field ofMedicine.


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