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1998 Hard cover New Sewn binding. Cloth over boards. 800 p. Contains: Illustrations. Audience: General/trade. BRAND NEW. gift quality. (shrinkwrap) NO DJ, as issued.
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More About This Textbook
Overview
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
Editorial Reviews
International Journal of Electrical Engineering Education
...The editors...have done an excellent gob of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field.Booknews
Details both elementary and advanced aspects of sub-micron microlithography, discussing theoretical and operating practices and providing complete information on current research. Coverage includes mechanical systems; optics; excimer laser light sources; alignment techniques and analysis; resist chemistry; processing; multilayer lithography; plasma and reactive ion etching; metrology; electron beam, x-ray, and proximal probe techniques. For physicists as well as electrical, optical, semiconductor, integrated circuit process, and process equipment engineers. Annotation c. by Book News, Inc., Portland, Or.Product Details
Related Subjects
Table of Contents
EXPOSURE SYSTEMS System Overview of Optical Steppers and Scanners, M.S. Hibbs Optical Lithography Modeling, C.A. Mack Optics for Photolithography, B.W. Smith Krypton Fluoride Excimer Laser for Advanced Microlithography, P. Das and U. Sengupta Alignment and Overlay, G.M. Gallatin Electron Beam Lithography Systems, G. Owen and J.R. Sheats X-Ray Lithography, T. Ueno and J.R. Sheats
RESISTS AND PROCESSING Chemistry of Photoresist Materials, T. Ueno Resist Processing, B.W. Smith Multilayer Resist Technology, B.W. Smith and M. Hanratty Dry Etching of Photoresists, R.R. Kunz
METROLOGY AND NANOLITHOGRAPHY Dimensional Metrology, H.M. Marchman E-Beam and Proximal Probe Processes for Nanolithography, E.A. Dobisz, F.K. Perkins, and M.C. Peckerar