Physical and Technical Problems of SOI Structures and Devices

by J.-P. Colinge (Editor), Vladimir S. Lysenko (Editor), Alexei N. Nazarov (Editor)

Overview

In Physical and Technical Problems of SOI Structures and Devices, specialists in silicon-on-insulator technology from both East and West meet for the first time, giving the reader the chance to become acquainted with work from the former Soviet Union, hitherto only available in Russian and barely available to western scientists. Keynote lectures and state-of-the-art presentations give a wide-ranging panorama of the challenges posed by SOI materials and devices, material fabrication techniques, characterisation, device and circuit issues.

Product Details

ISBN-13:	9780792336006
Publisher:	Springer-Verlag New York, LLC
Publication date:	06/30/1995
Series:	NATO Science Partnership Sub-Series: 3: Series , #4
Pages:	300
Product dimensions:	6.14(w) x 9.21(h) x 0.69(d)

Table of Contents

Soi Materials.- Low Dose SIMOX for ULSI Applications.- Why Porous Silicon for SOI?.- Defect Engineering in SOI Films Prepared by Zone-Melting Recrystallization.- Ion Beam Processing for Silicon-on-Insulator.- Semi-Insulating Oxygen-Doped Silicon by Low Temperature Chemical Vapor Deposition for SOI Applications.- Direct Formation of Thin Film Nitride Structures by High Intensity Ion Implantation of Nitrogen into Silicon.- Stimulated Technology for Implanted SOI Formation.- Behaviour of Oxygen and Nitrogen Atoms Sequentially Implanted into Silicon.- SOI Fabrication by Silicon Wafer Bonding with the Help of Glass-Layer Fusion.- Crystallization of a-Si Films on Glasses by Multipulse-Excimer-Laser Technique.- Microzone Laser Recrystallized Polysilicon Layers on Insulator.- Soi Materials Characterization Techniques.- Electrical Characterization Techniques for Silicon on Insulator Materials and Devices.- The Defect Structure of Buried Oxide Layers in SIMOX and BESOI Structures.- IR Study of Buried Layer Structure on Different Stages of Technology.- Optical Investigation of Silicon Implanted with High Doses of Oxygen and Hydrogen Ions.- Electrical Properties of ZMR SOI Structures: Characterization Techniques and Experimental Results.- Soi Devices.- Fabrication and Characterisation of Poly-Si TFTs on Glass.- Hot Carrier Reliability of SOI Structures.- Novel TESC Bipolar Transistor Approach for a Thin-Film Silicon-on-Insulator Substrate.- Problems of Radiation Hardness of SOI Structures and Devices.- Fabrication of SIMOX Structures and IC’s Test Elements.- Low-Frequency Noise Characterization of Silicon-on-Insulator Depletion-mode p-MOSFETS.- Soi Circuits.- SOI Devices and Circuits: An Overview of Potentials and Problems.- 1.2 µm CMOS/SOI on Porous Silicon.- SOI PressureSensors Based on Laser Recrystallized Polysilicon.

Editorial Reviews

Now that the language and security barriers are down that kept Soviet and western scientists from sharing their research into silicon-on-insulator technologies, an economic difficulty has risen its head: scientists in the now liberated free-market economy lack the money to travel long distances to conferences. Fortunately NATO-supported organizers and government-supported western scientists can, and so held the workshop near Yalta in the Crimea. The 28 papers discuss such topics as the direct formation of thin film nitride structures by high intensity ion implantation of nitrogen into silicon, electrical characterization techniques for silicon on insulator materials and devices, hot carrier reliability of SOI structures, and SOI pressure sensors based on laser recrystallized polysilicon. Annotation c. Book News, Inc., Portland, OR (booknews.com)

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