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Principles of Chemical Vapor Deposition: Thermal Plasma Deposition of Electronic Materials

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This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions.

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1995 Hard cover New. No dust jacket. Sewn binding. Cloth over boards. 292 p. Contains: Illustrations. Electrical Engineering. Audience: General/trade. *****PLEASE NOTE: This ... item is shipping from an authorized seller in Europe. In the event that a return is necessary, you will be able to return your item within the US. To learn more about our European sellers and policies see the BookQuest FAQ section***** Read more Show Less

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Overview

This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions.

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Editorial Reviews

Booknews
Enlightens process engineers on an increasingly key process in the development of ultra-large-scale integrated circuit fabrication, along with its subprocesses and the relationship between the structure and properties of thin films and the conditions during chemical vapor deposition. A multidisciplinary approach at a fundamental enough level that readers with a basic engineering background in most any field should be able to apply the techniques. Annotation c. Book News, Inc., Portland, OR (booknews.com)
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Product Details

Table of Contents

Preface
1 Introduction 1
2 Thin Film Phenomena 8
3 Manufacturability 41
4 Chemical Equilibrium and Kinetics 62
5 Reactor Design for Thermal CVD 94
6 Fundamentals of Plasma Chemistry 119
7 Processing Plasmas and Reactors 144
8 CVD of Conductors 163
9 CVD of Dielectrics 204
10 CVD of Semiconductors 227
11 Emerging CVD Techniques 266
Appendix - Vacuum Techniques for CVD 273
Index 287
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