Principles of Plasma Discharges and Materials Processing / Edition 1

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Overview

"The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters." With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
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Editorial Reviews

Booknews
A text-reference that offers an integrated presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications, especially in the fabrication of integrated circuits. Includes many fully worked examples, practice exercises, and demonstrations of the relationship of plasma parameters to external control parameters and processing results. Annotation c. Book News, Inc., Portland, OR booknews.com
From the Publisher
"The authors have done an excellent job…this is a good book for an academic course that will provide the foundation to senior-level and graduate students…" (MRS Bulletin, November2005)
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Product Details

  • ISBN-13: 9780471005773
  • Publisher: Wiley, John & Sons, Incorporated
  • Publication date: 1/28/1994
  • Edition description: Older Edition
  • Edition number: 1
  • Pages: 600
  • Product dimensions: 6.46 (w) x 9.58 (h) x 1.32 (d)

Meet the Author

MICHAEL A. LIEBERMAN, PhD, is Professor in the Graduate School in Electrical Engineering at the University of California, Berkeley. He has published more than 170 journal articles on the topics of plasmas, plasma processing, and nonlinear dynamics. He has also coauthored, with Professor Lichtenberg, Regular and Stochastic Motion and Regular and Chaotic Dynamics, Second Edition.

ALLAN J. LICHTENBERG, PhD, is Professor in the Graduate School in Electrical Engineering at the University of California, Berkeley. A respected pioneer in the fields of high-temperature plasmas, plasma discharges, and nonlinear dynamics, he has published about 150 articles in these areas. In addition to the books coauthored with Professor Lieberman, he has written an earlier monograph Phase-Space Dynamics of Particles (Wiley).

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Table of Contents

1 Introduction 1
2 Basic plasma equations and equilibrium 23
3 Atomic collisions 43
4 Plasma dynamics 87
5 Diffusion and transport 133
6 Direct current (DC) sheaths 165
7 Chemical reactions and equilibrium 207
8 Molecular collisions 235
9 Chemical kinetics and surface processes 285
10 Particle and energy balance in discharges 327
11 Capacitive discharges 387
12 Inductive discharges 461
13 Wave-heated discharges 491
14 Direct current (DC) discharges 535
15 Etching 571
16 Deposition and implantation 619
17 Dusty plasmas 649
18 Kinetic theory of discharges 679
App. A Collision dynamics 723
App. B The collision integral 727
App. C Diffusion solutions for variable mobility model 731
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