Rapid Thermal Processing of Semiconductors / Edition 1

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Overview

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

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Editorial Reviews

Booknews
Covers a wide range of materials, processes, and conditions with extensive references to sources of more detail on specific aspects of the thermal processing of material for semiconductor devices that lasts only seconds rather than the ten minutes to several hours of conventional thermal processing. Based largely on Borisenko's theoretical and experimental work in Belarussian. The topics include heating by radiation, the recrystalization of implanted layers and impurity behavior in silicon crystals, the diffusion synthesis of silicides in thin-film metal-silicon structures, oxidation and nitridation, and chemical vapor deposition. Annotation c. by Book News, Inc., Portland, Or.
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Product Details

  • ISBN-13: 9780306450549
  • Publisher: Springer US
  • Publication date: 5/31/1997
  • Series: Microdevices Series
  • Edition description: 1997
  • Edition number: 1
  • Pages: 384
  • Product dimensions: 10.00 (w) x 7.00 (h) x 0.88 (d)

Table of Contents

Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.

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