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Silicon Nitride and Silicon Dioxide Thin Insulating Films: Proceedings of the International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (6th: 2001: Washington, D. C.)
     

Silicon Nitride and Silicon Dioxide Thin Insulating Films: Proceedings of the International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (6th: 2001: Washington, D. C.)

by K. B. Sundaram (Editor)
 
The two dozen papers generally discuss either processing or characterizing, but more specifically the surface and interface investigation of ion-beam-deposited silicon oxide thin film, charging damage during plasma-enhanced dielectric deposition, compound formation and the segregation of impurities during the low-energy ion irradiation of silicon, silicon oxynitride

Overview

The two dozen papers generally discuss either processing or characterizing, but more specifically the surface and interface investigation of ion-beam-deposited silicon oxide thin film, charging damage during plasma-enhanced dielectric deposition, compound formation and the segregation of impurities during the low-energy ion irradiation of silicon, silicon oxynitride as a versatile material for integrated optics applications, and other topics.

Annotation c. Book News, Inc., Portland, OR (booknews.com)

Product Details

ISBN-13:
9781566773133
Publisher:
Electrochemical Society, The
Publication date:
01/01/2001
Pages:
286

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