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Silicon Processing for the VLSI Era: Process Technology, Second Edition / Edition 2

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Overview

Silicon Processing For The VLSI Era is a 3 volume treatise which provides a comprehensive, up-to-date treatment of this technology. Volume 1 covers the details of individual process steps used in fabricating silicon ICs. Volume 2 describes how these process steps are combined to make VLSI and ULSI structures. Volume 3 discusses the physics of MOS devices, emphasizing the link between submicron MOSFETs and their manufacturing processes. The books are an outgrowth of a set of intensive seminars conducted through the University of California Berkeley, Engineering Extension, for the past fifteen years. Over four thousand engineers and managers from more than 75 companies and government agencies have taken these courses since they were first presented in 1984.
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Product Details

  • ISBN-13: 9780961672164
  • Publisher: Lattice Press
  • Publication date: 9/1/2000
  • Edition description: 2ND
  • Edition number: 2
  • Pages: 952
  • Product dimensions: 7.70 (w) x 9.50 (h) x 1.80 (d)

Table of Contents

1. Silicon: Single-Crystal Growth & Wafer Preparation
2. Crystalline Defects And Gettering
3. Vacuum Technology For Ulsi Applications
4. Basics Of Thin Films
5. Cleaning Technology For Ulsi
6. Chemical Vapor Deposition Of Amorphous And Polycrystalline Films
7. Silicon Epitaxial Film Growth
8. Thermal Oxidation Of Silicon
9. Diffusion In Silicon
10. Ion Implantation For Ulsi
11. Aluminum Thin Films And Physical Vapor Deposition In Ulsi
12. Lithography I: Optical Photoresists - Material Properties And Process Technology
13. Lithography II: Optical Aligners And Photomasks
14. Dry Etching For Ulsi
15. Multilevel Metallization For Ulsi
16. Cmos Process Integration
17. Assembly And Packaging For Ulsi Appendices
Index
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