SiO2 in Si Microdevices / Edition 1

SiO2 in Si Microdevices / Edition 1

by Manabu Itsumi
     
 

ISBN-10: 3540433392

ISBN-13: 9783540433392

Pub. Date: 01/17/2003

Publisher: Springer Berlin Heidelberg

Electronic systems and digital computers are an indispensable element of modern multimedia technologies and the Internet society. But their explosive advance would not have been possible without the extraordinary progress in VLSI technology using high-quality SiO[subscript 2]. This volume addresses the thin gate oxides involved in the individual processes in…  See more details below

Overview

Electronic systems and digital computers are an indispensable element of modern multimedia technologies and the Internet society. But their explosive advance would not have been possible without the extraordinary progress in VLSI technology using high-quality SiO[subscript 2]. This volume addresses the thin gate oxides involved in the individual processes in fabrication, e.g. the growth, cleaning and thermal oxidation of silicon, metal interconnect formation, and photolithography. It describes new methods for observing defects in SiO[subscript 2] as well as novel approaches to eliminating such defects. The book will be a valuable resource for all materials scientists and engineers seeking to further advance the quality of silicon microdevices.

Product Details

ISBN-13:
9783540433392
Publisher:
Springer Berlin Heidelberg
Publication date:
01/17/2003
Series:
Springer Series in Materials Science Series, #56
Edition description:
2003
Pages:
322
Product dimensions:
9.21(w) x 6.14(h) x 0.81(d)

Table of Contents

Preface
1Introduction1
2Outline of Silicon Processes3
3Basic Characteristics of SiO[subscript 2]11
4Oxide Defect Locating Method23
5Correlation Between p-type Si and n-type Si Minority-carrier Recombination Lifetimes31
6Wafer Transient Deformation Observation41
7SiO[subscript 2] Weak Spots Originating in Si Wafers53
8Wafer Cleaning Process Affecting SiO[subscript 2] Dielectric Strength107
9Selective Oxidation Process Inducing SiO[subscript 2] Weak Spots123
10Thermal Oxidation Causing SiO[subscript 2] Instability147
11Polysilicon Gate Formation Process Affecting SiO[subscript 2] Quality165
12Metal Interconnect Formation Process Causing SiO[subscript 2] Deterioration189
13Si-SiO[subscript 2] Weak Spots System Repaired from Plasma Damage Through Water Pouring239
14Local Weak Spots Found in Poly-oxides and Buried Oxides265
15Oxide Reliability295
Index319

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