Thin-Film Deposition: Principles and Practice

by Donald L. Smith

Overview

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Product Details

ISBN-13:	9780070585027
Publisher:	McGraw Hill LLC
Publication date:	03/01/1995
Pages:	616
Product dimensions:	6.10(w) x 8.80(h) x 1.62(d)

About the Author

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Table of Contents

Thin Film Technology.Gas Kinetics.Vacuum Technology.Evaporation.Deposition.Epitaxy.Chemical Vapor Deposition.High-Energy Techniques.Plasma Processes.Film Characterization.

Editorial Reviews

A text on the basic principles of various thin-film vapor-phase deposition techniques, covering fundamentals and evolving topics including oil-free vacuum, microstructure control, selective CVD, and microanalysis. Discusses selection of techniques for specific applications, and shows how to predict and optimize deposition process behavior and solve production problems, with chapter exercises, a list of symbols and acronyms, and use of SI units. For graduate students in materials science, engineering, and applied physics. Annotation c. Book News, Inc., Portland, OR (booknews.com)

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