Applications of Intellectual Property Law in China: RIPL’s Special Issue 2012 by John Marshall Review of Intellectual Property Law
The John Marshall Review of Intellectual Property Law (RIPL) presents its third annual special issue as a part of its annual IP Symposium. In this year’s special issue and symposium, RIPL showcases seven articles from leading scholars and practitioners that focus on the theme of “Applications of Intellectual Property Law in China.”
The rapid growth of China of recent years is unparalleled throughout the world. This growth presents itself as an alluring opportunity for United States businesses. As the two superpowers learn to work together, the intersection of the country’s intellectual property rights continues to be a point of contention. To move forward, U.S. businesses must learn about the applications on intellectual property laws and policies in China and in Asia generally. This collection is presented as a step forward in that important mission.
The John Marshall Review of Intellectual Property Law also offers two previous Special Issues in ebook formats, and in summer 2010 became the first law journal to present a current issue in such leading ebook formats.