Pub. Date:
Elsevier Science
Developments in Surface Contamination and Cleaning - Fundamentals and Applied Aspects

Developments in Surface Contamination and Cleaning - Fundamentals and Applied Aspects


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Product Details

ISBN-13: 9780815515555
Publisher: Elsevier Science
Publication date: 12/03/2007
Pages: 1200
Product dimensions: 6.39(w) x 9.28(h) x 1.98(d)

About the Author

Dr. Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware, as well as for unmanned spacecraft. His technical interests are in particle behavior, precision cleaning, solution and surface chemistry, advanced materials and chemical thermodynamics. Dr. Kohli was involved in developing solvent-based cleaning applications for use in the nuclear industry and he also developed an innovative microabrasive system for a wide variety of precision cleaning and micro-processing applications in the commercial industry. He is the senior editor of this book series “Developments in Surface Contamination and Cleaning”; the first ten volumes in the series were published in 2008, 2010, 2011, 2012, 2013 (Volumes 5 and 6), 2015 (Volumes 7 and 8), and 2017 (Volumes 9 and 10), respectively. The second edition of Volume 1 was published in 2016. Volume 11 and Volume 12 (this volume) are expected to be published in 2019. Previously, Dr. Kohli co-authored the book “Commercial Utilization of Space: An International Comparison of Framework Conditions”, and he has published more than 270 technical papers, articles and reports on precision cleaning, advanced materials, chemical thermodynamics, environmental degradation of materials, and technical and economic assessment of emerging technologies. Dr. Kohli was recognized for his contributions to NASA’s Space Shuttle Return to Flight effort with the Public Service Medal, one of the agency’s highest awards.

Editor: ‘Reviews of Adhesion and Adhesives’

was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

Table of Contents

Part 1: Fundamentals
The Physical Nature of Very, Very Small Particles and its Impact on their Behavior
Elucidating the Nature of Very Small Particles
Transport and Deposition of Aerosol Particles
Relevance of Particle Transport in Surface Deposition and Cleaning
Tribological Implications of Particles
Airborne Molecular Contamination
Engineering Aspects of Particle Adhesion and Removal
ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
Part 2: Characterization of Surface Contaminants
Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
Surface Analysis Methods for Contaminant Identification
Ionic Contamination and Analytical Techniques for Ionic Contamination
Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants
Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3: Methods for Removal of Surface Contamination
The Use of Surfactants to Enhance Particle Removal from Surfaces
Cleaning with Solvents
Removal of Particles by Chemical Cleaning
Cleaning Using High-Speed Impinging Jet
Microabrasive Precision Cleaning and Processing Technology
Precision Cleaning Using Microdroplet Beams
Cleaning Using Argon/Nitrogen Cryogenic Aerosols
Carbon Dioxide Snow Cleaning
Coatings for Preventing or Deactivation of Biological Contaminants
Detailed Study of Semiconductor Wafer Drying

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