ISBN-10:
0815514328
ISBN-13:
9780815514329
Pub. Date:
01/01/2000
Publisher:
Elsevier Science
Handbook of Chemical Vapor Deposition, 2nd Edition: Principles, Technology and Applications / Edition 2

Handbook of Chemical Vapor Deposition, 2nd Edition: Principles, Technology and Applications / Edition 2

by Hugh O. Pierson

Hardcover

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Product Details

ISBN-13: 9780815514329
Publisher: Elsevier Science
Publication date: 01/01/2000
Series: Materials Science and Process Technology Series
Edition description: Subsequent
Pages: 508
Product dimensions: 1.25(w) x 9.00(h) x 6.00(d)

About the Author

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

Table of Contents

Introduction and General Considerations
Fundamentals of Chemical Vapor Deposition
The Chemistry of CVD
Metallo-Organic CVD (MOCVD)
CVD Processes and Equipment
The CVD of Metals
The CVD of the Allotropes of Carbon
The CVD of Non-Metallic Elements
The CVD of Ceramic Materials: Carbides
The CVD of Ceramic Materials: Nitrides
The CVD of Ceramic Materials: Oxides
The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides)
CVD in Electronic Applications: Semiconductors
CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers
CVD in Optoelectronic and Ferroelectric Applications
CVD in Optical Applications
CVD in Wear- and Corrosion-Resistant Applications
CVD in Cutting-Tool Applications
CVD in Fiber, Powder, and Monolithic Applications
Conversion Guide
Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification
Index

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