Hydrogenated Amorphous Silicon Alloy Deposition Processes

Hydrogenated Amorphous Silicon Alloy Deposition Processes

by Werner Luft, Y. Simon Tsuo

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Overview

Hydrogenated Amorphous Silicon Alloy Deposition Processes by Werner Luft, Y. Simon Tsuo

This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.

Product Details

ISBN-13: 9780824791469
Publisher: Taylor & Francis
Publication date: 05/28/1993
Series: Applied Physics Series , #1
Pages: 344
Product dimensions: 6.25(w) x 9.25(h) x 0.75(d)

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