This book is a comprehensive source of the fundamentals, process parameters, instrumental components and applications of laser-induced breakdown spectroscopy (LIBS). The effect of multiple pulses on material ablation, plasma dynamics and plasma emission is presented. A heuristic plasma modeling allows to simulate complex experimental plasma spectra. These methods and findings form the basis for a variety of applications to perform quantitative multi-element analysis with LIBS. These application potentials of LIBS have really boosted in the last years ranging from bulk analysis of metallic alloys and non-conducting materials, via spatially resolved analysis and depth profiling covering measuring objects in all physical states: gaseous, liquid and solid. Dedicated chapters present LIBS investigations for these tasks with special emphasis on the methodical and instrumental concepts as well as the optimization strategies for a quantitative analysis. Requirements, concepts, design and characteristic features of LIBS instruments are described covering laboratory systems, inspections systems for in-line process control, mobile systems and remote systems. State-of-the-art industrial applications of LIBS systems are presented demonstrating the benefits of inline process control for improved process guiding and quality assurance purposes.
|Publisher:||Springer Berlin Heidelberg|
|Product dimensions:||6.10(w) x 9.25(h) x 0.06(d)|
About the Author
Dr. Reinhard Noll is Head of competence field laser measurement technology at Fraunhofer.
Table of ContentsIntroduction.- Laser-induced breakdown spectroscopy.- Process parameters.- Instrumental components.- Evaporation and plasma generation.- Multiple-pulses for LIBS.- Material ablation.- Plasma dynamics and plasma parameters.- Plasma emission.- Modeling of plasma emission.- Quantitative analysis.- Combination of LIBS and LIF.- Bulk analysis of metallic alloys.- Bulk analysis of non-conducting materials.- Spatially resolved analysis.- Depth profiling.- LIBS instruments.- Industrial applications.