ISBN-10:
0841209340
ISBN-13:
9780841209343
Pub. Date:
01/15/1986
Publisher:
American Chemical Society
Microelectronic Processing: Inorganic Materials Characterization

Microelectronic Processing: Inorganic Materials Characterization

by Lawrence Casper

Hardcover

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Overview

Microelectronic Processing: Inorganic Materials Characterization

Examines leading-edge developments in the field of materials development. Covers all major aspects of materials science, with applications to many high technology areas. Explores the role of chemistry in high-tech materials and their applications.

Product Details

ISBN-13: 9780841209343
Publisher: American Chemical Society
Publication date: 01/15/1986
Series: ACS Symposium Series
Pages: 456
Product dimensions: 6.10(w) x 9.00(h) x 1.10(d)

Table of Contents

Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices
Electrical Characterization of Semiconductor Materials and Devices
Dopant Profiles by the Spreading Resistance Technique
SEM Techniques for Characterization of Semiconductor Materials
Semiconductor Materials Defect Diagnostics for Submicron VLSI Technology
Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic Materials
Applications of Auger Electron Spectroscopy in Microelectronics
X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
Application of Neutron Depth Profiling to Microelectronic Materials Processing
Thermal-Wave Measurement of Thin Film Thickness
Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
Measurement of the Oxygen and Carbon Content of Silicon Wafers by Fourier Transform Spectrophotometry
Application of the Raman Microprobe to Analytical Problems of Microelectronics
Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
Thermal-Wave Imaging in a Scanning Electron Microscope
Fourier Transform Mass Spectrometry in the Microelectronics Service Laboratory
Materials Characterization Using Elemental and Isotope Analysis by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
Activation Analysis of Electronics Materials
Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
Characterization of Components in Plasma Phosphorus Doped Oxides
Process Control of Vacuum-Deposited Nickel-Chromium for the Fabrication of Reproducible Thin Film Resistors
Characterization of Spin-On Glass Films as a Planarizing Dielectric
Effects of Various Chemistries on Silicon Wafer Cleaning
Monitoring of Particles in Gases Using a Laser Counter
Microelectronics Processing Problem Solving: The Synergism of Complementary Techniques

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