Microscopy of Semiconducting Materials, 1989: Proceedings of the Royal Microscopical Society Conference at Oxford University, April 1989

Microscopy of Semiconducting Materials, 1989: Proceedings of the Royal Microscopical Society Conference at Oxford University, April 1989

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Overview

Microscopy of Semiconducting Materials, 1989: Proceedings of the Royal Microscopical Society Conference at Oxford University, April 1989 by Taylor and Francis

Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.

Product Details

ISBN-13: 9780854980567
Publisher: Taylor & Francis
Publication date: 01/01/1989
Series: Institute of Physics Conference Ser. , #100
Pages: 820

Table of Contents

High resolution microscopy (9 papers). Microanalysis (5 papers). Epitaxial layers (24 papers). Quantum wells and superlattices (13 papers). Bulk gallium arsenide and other compounds (14 papers). X-ray studies (5 papers). Device silicon and dielectric structures (15 papers). Silicides and metal-semiconductor contacts (13 papers). Electron beam testing and device studies (4 papers). Advanced scanning microscopy techniques (16 papers). Author index. Subject index.

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