Pub. Date:
Oxford University Press, USA
Monte Carlo Modeling for Electron Microscopy and Microanalysis

Monte Carlo Modeling for Electron Microscopy and Microanalysis

by David C Joy


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This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis.
Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout,
the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.

Product Details

ISBN-13: 9780195088748
Publisher: Oxford University Press, USA
Publication date: 04/13/1995
Series: Oxford Series on Optical and Imaging Sciences Series , #9
Pages: 224
Product dimensions: 6.38(w) x 9.50(h) x 0.89(d)

Table of Contents

1. Preface
2. An Introduction to Monte Carlo Methods
3. Constructing a Simulation
4. The Single Scattering Model
5. The Plural Scattering Model
6. Practical Applications of Monte Carlo Models
7. Backscattered Electrons
8. Charge Collection and Cathodoluminescence
9. Secondary Electrons and Imaging
10. X-Ray Production and Micro-Analysis
11. What Next in Monte Carlo Simulations?

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