ISBN-10:
0824757882
ISBN-13:
9780824757885
Pub. Date:
11/10/2004
Publisher:
Taylor & Francis
Luminous Chemical Vapor Deposition and Interface Engineering / Edition 1

Luminous Chemical Vapor Deposition and Interface Engineering / Edition 1

by Hirotsugu Yasuda

Hardcover

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Product Details

ISBN-13: 9780824757885
Publisher: Taylor & Francis
Publication date: 11/10/2004
Series: Surfactant Science Series , #122
Edition description: New Edition
Pages: 840
Product dimensions: 7.00(w) x 10.00(h) x 1.70(d)

Table of Contents

FUNDAMENTALS OF LUMINOUS CHEMICAL VAPOR DEPOSITION
Introduction
Domain of LCVD
Luminous Gas Phase
Creation of Chemically Reactive Species in LCVD
Growth and Deposition Mechanisms
Dangling Bonds
Chemical Structures of Organic Compounds for LCVD
Deposition Kinetics
Ablation by Luminous Gas (Low Pressure Plasma)
Competitive Ablation and Polymerization
Internal Stress in Material Formed by LCVD

OPERATION OF LUMINOUS CHEMICAL VAPOR DEPOSITION AND TREATMENT
Modes of Operation and Scale-Up Principle
CD & Alternating Current Discharge
Anode Magnetron Discharge
Low-Pressure Cascade Arc Torch (LPCAT)
Anode Magetron Torch
Primary, Secondary, and Pulsed Discharges
Rector Size
Flow Pattern
Composition Graded Transition Phase
Tumbler Reactor

FUNDAMENTALS OF SURFACE AND INTERFACE
Surface Configuration
Surface State
Surface Dynamics
Contact Angle and Wettability
Sessile Bubble Formation and Detachment

INTERFACE ENGINEERING.
Principle for Interface Egnineering
Creation of Imperturbable Surface
Creating Adhesion to Substrate Surfaces
Corrosion Protection of Aluminum Alloys
Corrosion of Ion Vapor Deposited (IVD) Aluminum
Corrosion Protection of Cold Rolled Steel and Pure Iron
Membrane Preparation and Modification
Application of LCVD in Biomaterials
Economical Advantages of LCVD

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