Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies / Edition 1

by M. Gentili, Carlo Giovannella, Stefano Selci

Overview

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques — electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) — as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Product Details

ISBN-13:	9780792327943
Publisher:	Springer Netherlands
Publication date:	04/30/1994
Series:	NATO Science Series E: , #264
Edition description:	1994
Pages:	216
Product dimensions:	6.10(w) x 9.25(h) x 0.02(d)

Table of Contents

Content.- Electron Beam Lithography.- Nanolithography, The Integrated System.- Electron Beam Resists and Pattern Transfer Methods.- Nanolithography Developed Through Electron-Beam-Induced Surface Reaction.- Direct Writing of Nanoscale Patterns in SiO2.- Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist.- Surface Imaging for EB-Nanolithography.- Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier.- Fabrication of Ultrasmail InGaAslInP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching.- Fabrication, Investigation and Manipulation of Artificial Nanostructures.- Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition.- Nanolithography Requirements — An Equipment Manufacturers View.- X-Ray Lithography.- X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing.- X-Ray Phase Shifting Masks.- Fabrication of X-Ray Mask for Nanolithography by EBL.- Ion Beam Lithography.- Intense Focused Ion Beams for Nanostructurisation.- Latest Results Obtained with the Alpha Ion Projection Machine.- STM Lithography.- Direct Writing with a Combined STM/SEM System.- Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope.- STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide.- Sub-20 nm Lithographic Patterning with the STM.- Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope.- Author Index.

Editorial Reviews

Specialists in the various types of lithography trade their latest in techniques and technologies to allow the etching of ultrafast and/or ultradense electronic circuits with structures smaller than 100 nanometers. Everyone agrees that all future electronic devices will depend on nanolithography and the condensed matter physics it makes possible. The 21 papers are from the perspectives of electron-beam, x-ray, ion-beam, and scanning-tunneling lithographies. The subject index is one page long. Annotation c. Book News, Inc., Portland, OR (booknews.com)

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