Physics of Radio-Frequency Plasmas

Physics of Radio-Frequency Plasmas

ISBN-10:
0521763002
ISBN-13:
9780521763004
Pub. Date:
02/24/2011
Publisher:
Cambridge University Press
ISBN-10:
0521763002
ISBN-13:
9780521763004
Pub. Date:
02/24/2011
Publisher:
Cambridge University Press
Physics of Radio-Frequency Plasmas

Physics of Radio-Frequency Plasmas

$135.0
Current price is , Original price is $135.0. You
$135.00 
  • SHIP THIS ITEM
    In stock. Ships in 1-2 days.
  • PICK UP IN STORE

    Your local store may have stock of this item.

  • SHIP THIS ITEM

    Temporarily Out of Stock Online

    Please check back later for updated availability.


Overview

Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

Product Details

ISBN-13: 9780521763004
Publisher: Cambridge University Press
Publication date: 02/24/2011
Edition description: New Edition
Pages: 394
Product dimensions: 6.90(w) x 9.80(h) x 1.00(d)

About the Author

Pascal Chabert is currently Research Director within CNRS. He leads the Low-Temperature Plasmas group of the Laboratoire de Physique des Plasmas at Ecole Polytechnique. His expertise is in plasma physics and plasma processing.

Nicholas Braithwaite is Professor of Engineering Physics at The Open University, where his research group work on the physics of 'technological' plasmas. He has been on the editorial board of the journal Plasma Sources Science and Technology since 1998.

Table of Contents

1. Introduction; 2. Plasma dynamics and equilibrium; 3. Bounded plasmas; 4. Radiofrequency sheaths; 5. Single frequency capacitively-coupled plasmas; 6. Multi-frequency capacitively-coupled plasmas; 7. Inductively-coupled plasmas; 8. Helicon plasmas; 9. Real plasmas; 10. Electrical measurements; Index.
From the B&N Reads Blog

Customer Reviews