Dry Etching Technology for Semiconductors

Dry Etching Technology for Semiconductors

by Kazuo Nojiri

Paperback(Softcover reprint of the original 1st ed. 2015)

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Product Details

ISBN-13: 9783319356242
Publisher: Springer International Publishing
Publication date: 10/28/2016
Edition description: Softcover reprint of the original 1st ed. 2015
Pages: 116
Sales rank: 398,009
Product dimensions: 6.10(w) x 9.25(h) x 0.01(d)

About the Author

Kazuo Nojiri is a CTO of Lam Research Japan. He has 37 years of experience in semiconductor industry. Prior to joining Lam in 2000, he worked for Hitachi Ltd. for 25 years, where he held numerous management positions for Dry Etching and Device Integration. He is also known as a pioneer in the research field of charging damage. He published 38 technical papers and 3 books. In 1984 he was awarded the Okouchi Memorial Prize for the development of ECR plasma etching technology.

Table of Contents

Contribution of Dry Etching Technology to Progress of Semiconductor Integrated Circuit.- Mechanism of Dry Etching.- Dry Etching of Various Materials.- Dry Etching Equipments.- Dry Etching Damage.- Latest Dry Etching Technologies.- Future Challenges and Outlook for Dry Etching Technology.

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