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Efficient Extreme Ultraviolet Mirror Design: An FDTD approach

By Yen-Min Lee
eBook
$159.00
By Yen-Min Lee
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Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the op...

Categories

Science & TechnologyEngineeringPhysicsEngineering TechnologyPhysics of LightPhysics of Light - OpticsOptics - General & MiscellaneousOptics->General